25 Infos zu Andre Poock

1 Aktuelle Nachrichten

4 Hobbys & Interessen

... Poock patents. Recent bibliographic sampling of Andre Poock patents listed/published in the public domain by the USPTO (USPTO Patent Application #,Title): ...

Mask defects, such as crystal growth defects and the like, may be efficiently detected and estimated at an early stage of their development by generating test images of the mask under consideration and inspecting the images on the basis of wafer inspection techniques in order to identify repeatedly occurring defects.... Inventors: Uwe Griebenow, Martin Mazur, Wolfram Grundke, Andre Poock · Globalfoundries Inc. Archived* (*May have duplicates - we are upgrading ...

Inventors on Globalfoundries Inc patents (2012) ... Note: Some Globalfoundries Inc-related inventors may appear under alternate organization ... Andre Poock.

Inventors: Uwe Griebenow, Martin Mazur, Wolfram Grundke, Andre Poock · Globalfoundries Inc. Archived* (*May have duplicates - we are upgrading our archive ...

1 Business-Profile

GLOBALFOUNDRIES INC., Malschwitz, DE

4 Dokumente

von CY Yang · — 4Brian J. Grenon, Kaustuve Bhattacharyya, William Volk, Khoi Phan, Andre Poock, Reticle Surface Contaminants and Their Relationship to ...

Andre Poock l. , Uwe Knappe l. , Torsten. Fahr', Astrid Gettel' and Wolfram Grundke'; 'Strategic Lithography,. Advanced Micro Devices, Sunnyvale, ...

Andre Poock, Sarah McGowan, Francois Weisbuch. AMD, Saxony LLC & Co. KG. Guido Schnasse, Rajesh Ghaskadvi. KLA-Tencor Corporation, San Jose, USA.

Spring Yield Management Solutions32 Introduction Sub-pellicle reticle contamination was first reported by Grenon et al.1 as a major concern in high volume...

1 Wissenschaftliche Publikationen

Type: Grant. Filed: April 3, Date of Patent: July 12, Assignee: Globalfoundries Inc. Inventors: Andre Poock, Jan Hoentschel ...

1 Allgemeine Veröffentlichungen

SPIE Profile of Andre Poock, GLOBALFOUNDRIES Dresden Module Two. SPIE Profiles is a networking platform for optics and photonics professionals.

13 Webfunde aus dem Netz

US A Andre Poock Reducing implant degradation in tilted implantations by shifting implantation masks.

Andre Poock's 9 research works with 43 citations and 2,295 reads, including: Mask parameter variation in the context of the overall variation budget of an advanced logic wafer Fab Andre Poock's ...

Andre Poock, Stephanie Maelzer, Chris Spence, Cyrus Tabery, Michael Lang, Guido Schnasse, Milko Peikert, and Kaustuve Bhattacharyya, Wafer Fab Mask ...

von C Spence · — Chris Spence, Cyrus Tabery, Andre Poock, Arndt C. Duerr, Thomas Witte, Jan Fiebig, and Jan Heumann "Use of layout automation and design-based metrology for ... von BJ Grenon · · Zitiert von: 28 — Andre Poock, "Reticle surface contaminants and their relationship to sub- pellicle defect formation," Proc. SPIE 5375, Metrology, Inspection, and.

2007 design automation and test in

Jugendleiter: Andre Poock Mobil: [0152] Schiedsrichterobmann: Thomas Schuster Telefon: [ ]

Andre Poock, S.M., Francois Weisbuch, OPC hotspot identification challenges: ORC vs. PWQ on wafer. SPIE, Vol.7122:p Y.

SPIE Digital Library Proceedings

2 Editorial This is not your father s photomask Tom Faure, IBM Corporation During a ... Paul W. Ackmann, GLOBALFOUNDRIES Inc. International Chair Naoya Cyrus Tabery, Andre Poock *, Arndt C. Duerr #, Thomas Witte #, Jan Fiebig # ...

Assignees: GLOBALFOUNDRIES INC. IPC8 Class: USPC Class: Patent applications by Andre Poock, Malschwitz DE

Patent application title: METHOD OF DETECTING REPEATING DEFECTS IN LITHOGRAPHY MASKS ON THE BASIS OF TEST SUBSTRATES EXPOSED UNDER VARYING CONDITIONS. Inventors: Uwe Griebenow Martin Mazur Wolfram Grundke Andre Poock Agents: WILLIAMS, MORGAN & AMERSON

... Incorporated William Volk and Kaustuve Bhattacharyya, KLA-Tencor Corporation Andre Poock, AMD Saxony Crystal growth and haze formation on reticles ...