41 Infos zu Andreas Norbert Wiswesser

1 Aktuelle Nachrichten

2 Profile in Sozialen Netzwerken

Andreas Wiswessers berufliches Profil anzeigen LinkedIn ist das weltweit größte berufliche Netzwerk, das Fach- und Führungskräften wie Andreas Wiswesser ...

Sehen Sie sich das berufliche Profil von Andreas Wiswesser (Deutschland) auf LinkedIn an. LinkedIn ist das weltweit größte professionelle Netzwerk, das Fach

1 Hobbys & Interessen

Recent bibliographic sampling of Andreas Wiswesser patents listed/published in the public domain by the USPTO (USPTO Patent Application #,Title): ...

1 Business-Profile

APPLIED MATERIALS, INC., Freiberg, DE

6 Bücher zum Namen

von Norbert Wiswesser, Technische Universität Bergakademie FreibergTaschenbuch

... AND APPARATUS FOR DETERMINING SUBSTRATE LAYER THICKNESS DURING CHEMICAL MECHANICAL POLISHING Andreas Norbert Wiswesser , Freiberg ; Walter Schoenleber ...

7,008,295 Andreas Norbert Wiswesser et al DECISION ON REQUEST FOR RECONSIDERATION OF Issue Date: March 7, Application No ,852 Filed: February 4, ...

... Andreas Wiswesser, Oliver Loffler, AMTC, Dresden, Germany Application of PGSD (Proximity Gap Suction Development) to 70 nm NAND Mask Fabrication ...

1 Songs & Musik

Applicant : Andreas Norbert Wiswesser et al. Attorney's Docket No.: C4 Serial No. : ,716 Filed : November 25, Page : 3 of › stream ›

5 Dokumente

— ... FOR MODELING SUBSTRATE REFLECTIVITY DURING CHEMICAL MECHANICAL POLISHING, by Andreas Wiswesser, filed Oct. 31, 1997, and assigned to the ... › ...

Academia.edu is a place to share and follow research.

The thickness of a layer on a substrate is measured in-situ during chemical mechanical polishing. A light beam is divided through a window in a polishing pad,...

— metrology, Oliver Löffler, Jan Richter, Andreas Wiswesser, Advanced Mask. Technology Ctr. GmbH Co. KG (Germany); Frank Laske, Dieter K. Adam ... › files › PM10+advance

1 Allgemeine Veröffentlichungen

— Andreas Wiswesser · Andreas Wiswesser. This person is not on ResearchGate, or hasn't claimed this research yet. Pavel Nesladek · Norbert Falk · Andreas Wiswesser · Renee Koch · Björn Sass. Increasing demand for high end lithography mask especially phase shift masks ... › › figure

23 Webfunde aus dem Netz

... Andreas Norbert Wiswesser, Jason Wright: Antragsteller: Applied Materials Inc: Zitat exportieren: BiBTeX, EndNote, RefMan: Patentzitate (5), Klassifizierungen (

A polishing layer of a polishing has a window member with a top surface positioned a predetermined distance below the polishing surface. A transparent...

Download PDF Find Prior Art Similar. Other languages: French; Inventor: Andreas Norbert Wiswesser: Walter Schoenleber: Boguslaw Swedek ... › patents

97 results — Andreas Norbert Wiswesser 1, Wallter Waiter Schoenleber 1, Boguslaw A. Swedek 1•Institutions (1). 25 Oct Abstract: The thickness of a layer ... › papers

ANDREAS NORBERT WISWESSER et. al. APPLIED MATERIALS INC · Customized polishing pads for CMP and methods of fabrication and use thereof › patent...

Inventor: Andreas Norbert Wiswesser: Boguslaw A. Swedek; Current Assignee. The listed assignees may be inaccurate. Google has not performed a legal analysis ... Inventor: Andreas Norbert Wiswesser; Current Assignee. The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no ... › patent

... search report. Download PDF Find Prior Art Similar. Other languages: English; Inventor: Jason Wright: Andreas Norbert Wiswesser: Boguslaw A. Swedek ...

The thickness of a layer on a substrate is measured in-situ during chemical mechanical polishing. A light beam is divided through a window in a polishing...

Andreas Norbert Wiswesser - Mountain View CA Stan D. Tsai - Fremont CA David A. Chan - Sunnyvale CA Fred C. Redeker - Fremont CA › Rajeev

@inproceedings{Nesldek2008CDOB, title={CDO budgeting}, author={Pavel Nesl{\'a}dek and Andreas Norbert Wiswesser and Bj{\"o}rn Sass and Sebastian Mauermann}, ...

Andreas Norbert Wiswesser DE; Wallter Waiter Schoenleber DE; Boguslaw Swedek. Method and apparatus for measuring substrate layer thickness during chemical ... › srch

A system includes a measuring station for positioning an eddy current probe proximate to a substrate in a substrate holder. The probe can produce a...

... WO A1, WO A1, WO A1. Inventors, Manoocher Birang, Judon Tony Pan, Boguslaw Swedek, Andreas Norbert Wiswesser.

Nesladek, Pavel, Falk, Norbert, Wiswesser, Andreas,. Koch, Renee, Sass, Björn. Pavel Nesladek, Norbert Falk, Andreas Wiswesser, Renee Koch, Björn Sass,. › Download

1 Approaching Zero Etch Bias at Cr Etch Process Pavel Nesladek a ; Norbert Falk b ; Andreas Wiswesser a ; Renee Koch b ; Björn Sass a a Advanced Mask ...

SPIE Digital Library Proceedings

Approaching Zero Etch Bias at Cr Etch Process Pavel Nesladek a ; Norbert Falk b ; Andreas Wiswesser a ; Renee Koch b ; Björn Sass a a Advanced Mask ... › Television

Petitioner (name): Andreas Wiswesser has petitioned for court approval of a proposed compromise of a disputed claim of a minor or a pending action involving ... › doc › order-app...

290 : Werkstoffwissenschaft, Werkstofftechnologie: Röntgen- und Synchrotronstrahlung zur Untersuchung von Strukturdefekten in GaAs Norbert Wiswesser

— [9] Björn Sass, Ralf Schubert, Thomas Jakubski, Sebastian Mauermann, Pavel Nesladek, Andreas Wiswesser, Karl-. Heinz Gindra, and Ray Malone, ... › Download