23 Infos zu Andreas Wiswesser

1 Aktuelle Nachrichten

3 Profile in Sozialen Netzwerken

Andreas Wiswessers berufliches Profil anzeigen LinkedIn ist das weltweit größte professionelle Netzwerk, das Fach- und Führungskräften wie Andreas Wiswesser …

View Andreas Wiswesser's business profile as Manager at 自动售货机. Find Andreas' email address, mobile number, work history, and more.

1 Hobbys & Interessen

Recent bibliographic sampling of Andreas Wiswesser patents listed/published in the public domain by the USPTO (USPTO Patent Application #,Title): ...

2 Bücher zum Namen

... Andreas Wiswesser, Oliver Loffler, AMTC, Dresden, Germany Application of PGSD (Proximity Gap Suction Development) to 70 nm NAND Mask Fabrication (Abstract) ...

... Japan, Komukai Toshiba-cho, Saiwai-ku, Kawasaki; Tsuneyuki Hagiwara, Naoto Kondo, Nikon Corp., Japan Endpoint detection development for 70 nm technology Cr etch process 41 Pavel Nesladek, Andreas Wiswesser, Oliver Loffler, AMTC, Dresden, Germany Application of PGSD (Proximity Gap Suction Development) ...

2 Dokumente

The thickness of a layer on a substrate is measured in-situ during chemical mechanical polishing. A light beam is divided through a window in a polishing pad,...

Andreas Wiswesser studies Industrial Technology, Inspection, and Production Process.

1 Wissenschaftliche Publikationen

Diss. ; Techn. Univ., (Freiberg), Dokumentumtípus: Könyv (monografikus szint). Szerzőségi közlés: Andreas Wiswesser. Szerző: Wiswesser, Andreas.

1 Allgemeine Veröffentlichungen

The ever-narrowing specifications for high-end masks can only be derived from ... Author(s): Pavel Nesladek; Andreas Wiswesser; Björn Sass; Jan Richter ...

13 Webfunde aus dem Netz

View Andreas Wiswesser's professional profile on LinkedIn. LinkedIn is the world's largest business network, helping professionals like Andreas Wiswesser  ...

The thickness of a layer on a substrate is measured in-situ during chemical mechanical polishing. A light beam is divided through a window in a polishing...

Opfindere, Andreas Wiswesser. Ansøger, Applied Materials Inc. Eksportér citat, BiBTeX, EndNote, RefMan. Patentcitater (4), Ikke-patentcitater (1), Refereret af ...

Endpoint Detection Development for 70 nm Technology Cr Etch Process Pavel Nesladek a, Andreas Wiswesser a, Oliver Löffler b a AMTC, Dresden, Germany, b AMD, Dresden, Germany Abstract For the last few years.

1 Approaching Zero Etch Bias at Cr Etch Process Pavel Nesladek a ; Norbert Falk b ; Andreas Wiswesser a ; Renee Koch b ; Björn Sass a a Advanced Mask ...

SPIE Digital Library Proceedings

Pavel Nesladek, Andreas Wiswesser, Björn Sass, and Jan Richter "Metrology limits of mask process development", Proc. SPIE 6283, Photomask and ...

... Naoto Kondo, Nikon Corp., Japan Endpoint detection development for 70 nm technology Cr etch process Pavel Nesladek, Andreas Wiswesser, Oliver Löffler, ...

24th European Mask and Lithography Conference; CDO Budgeting

On MARIA WISWESSER filed a Personal Injury - Other Personal Injury court case against BASAM AUTOMATED ENTRANCE SYSTEMS in San Francisco County...

patrick wisswesser

1 RTNN Etch capabilities A Partnership Between NC State University, Duke University, and UNC Chapel Hill Trion Minilock ...

1 Undercut of Unxis-ICP-Deposited-SiO 2, y Vpor HF Etch Ojective: To study the undercut-etch-rte of high-density-plsm-cv...