92 Infos zu Massimo Tallarida

4 Aktuelle Nachrichten

by Massimo Tallarida, LOREA Beamline responsible.

Status of the new ARPES beamline at ALBA: LOREA. Prof. Massimo Tallarida (on behalf of the LOREA group). ALBA Synchrotron Light Source, ...

Joachim Schnadt, Claudia Wiemer, Gianluca Ciatto, Kamil Kosiel (from left). The audience. Agata Poniedziałek: organization help. Openning by Małgorzata Kot. Openning by Małgorzata Kot. Merck sponsoring. Massimo Tallarida and Małgorzata Kot. Massimo Tallarida. P. Hönicke. P. Hönicke. G. Laricchiuta. G. Laricchiuta.

For more information, please contact Massimo Tallarida. The Brandenburgische Technische Universität, Cottbus is pleased to present the. winterschool/compact ...

6 Profile in Sozialen Netzwerken

Sehen Sie sich das Karriere-Profil von Massimo Tallarida (Deutschland) auf LinkedIn an. LinkedIn ist das weltweit größte professionelle Netzwerk, das Fach- ...

Sehen Sie sich das Profil von Massimo Tallarida auf LinkedIn an, dem weltweit größten beruflichen Netzwerk. 3 Jobs sind im Profil von Massimo Tallarida ...

Ver el perfil profesional de Massimo Tallarida en LinkedIn. LinkedIn es la red de negocios más grande del mundo que ayuda a profesionales como Massimo ...

Massimo Tallaridas berufliches Profil anzeigen LinkedIn ist das weltweit größte professionelle Netzwerk, das Fach- und Führungskräften wie Massimo Tallarida  ...

2 Firmen-Mitarbeiter

BEAMLINE SCIENTISTS. IM_MTallarida. Massimo Tallarida Beamline Responsible Tel.: (+34) E-mail. IM_LOREAStaff. IM_FBisti, Federico Bisti

Downloads · Links · Bilderarchiv. Angewandte Physik/Sensorik > Mitarbeiter > Massimo Tallarida ... Dr. Massimo Tallarida. Wissenschaftlicher Mitarbeiter ...

1 Persönliche Webseiten

Karsten Henkel, Hassan Gargouri, Bernd Gruska, Michael Arens, Massimo Tallarida and Dieter Schmeißer. J. Vac. Sci. Technol. A 32, 01A107 (2014) | Read ...

7 Bücher zum Namen

Information about the open-access article 'Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films' in DOAJ....

Author: Massimo Tallarida. Results. The initial atomic layer deposition of HfO2Si(001) as followed in situ by synchrotron radiation photoelectron spectroscopy.

... David C. Smith, Pia Sundberg, Jonas Sundqvist, Dmitry Suyatin, Massimo Tallarida, Tobias Törndahl, Mikko Utriainen, J. Ruud van Ommen, Thomas Wächtler, ...

... Berichtszeitraum: Front Cover. Dieter Schmeißer, Massimo Tallarida, Karsten Henkel. BTU, LS Angewandte Physik-Sensorik,

5 Dokumente

Tutorial lecture given at the 14th International Conference on Atomic Layer Deposition in Kyoto, June 15,

Massimo Tallarida studies Materials Science & Engineering, Electromagnetic Fields and Microwave Techniques, and Electron Microscopy.

2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim p s s current topics in solid state physics c st a tu s so li d i www.pss-c.comp h y si ca Phys. Status Solidi...

ALBA-CELLS . Study, Design and Optimization Analysis of the ALBA. LOREA Dipole Vacuum Chamber and Crotch Absorbers. Based on Finite Element Analysis. Abstract. Marcos Quispe, Josep Campmany, Joan Casas, Carles Colldelram, Alejandro Crisol, Jordi Marcos, Gabriel Peña,. Massimo Tallarida.

5 Wissenschaftliche Publikationen

Dr. Massimo Tallarida. Als Beteiligte Person laufende Projekte. Fundamental and functional properties of ultra-thin oxide films grown by atomic layer deposition.

... of bulk and interface defects in silicon oxide with X-ray absorption spectroscopy. Original research article: Pages Massimo Tallarida, Dieter Schmeisser.

Massimo Tallarida. ∗. , Daniel Friedrich, Matthias Städter, Marcel Michling, and Dieter Schmeisser. Brandenburg University of Technology, Konrad Wachsmann ...

Dr. Massimo Tallarida, Fachgebiet Angewandte Physik/Sensorik, Platz der Deutschen Einheit 1, Cottbus.

7 Allgemeine Veröffentlichungen

Massimo Tallarida

Academic Editor: Massimo Tallarida. Copyright © Ravneet Kaur et al. This is an open access article distributed under the Creative ...

I would like to thankmy coauthors Dr. Massimo Tallarida for sharing his experience and immeasurablehelp throughout the course of this work. For technical help ...

SESSION CM04.07: Hard X-Ray Techniques Session Chairs: Geoffroy Prevot and Massimo Tallarida Thursday Morning, April 5, PCC North, 100 Level, ...

3 Meinungen & Artikel

Here is a new paper from Massimo Tallarida and co-workers group in Cottbus at Brandenburg University of Technology in collaboration with ...

Amirhasan Nourbakhsh, Christoph Adelmann, Yi Song, Chang Seung Lee, Inge Asselberghs, Cedric Huyghebaert, Simone Brizzi, Massimo Tallarida, Dieter Schmeißer, Sven Van Elshocht, Marc Heyns, Jing Kong, Tomás Palacios and Stefan De Gendt. Nanoscale, 2015, Advance Article DOI:

Dr. Massimo Tallarida (ALBA Synchrotron Light Source, Spain) "Recent advances and future directions in the investigation of ALD films with ...

52 Webfunde aus dem Netz

source in Barcelona, Spain. He has been associate researcher at the BTU in ...

Amb Massimo Tallarida, responsable de la línia de llum LOREA.

A list of publications in the Plasma Enhanced Atomic Layer Deposition database written by Massimo Tallarida.

Massimo Tallarida. Details · Publications ... Massimo Tallarida, Dieter Schmeisser · Materials Science & Engineering B 144 , 1-3 ,

5 Acknowledgements This thesis is based on the experimental work carried out in the Chair Applied Physics and Sensors, Brandenburg University of Technology Cottbus and BESSY, during the years I wish to express my deep gratitude to my supervisor Professor Dieter Schmeisser for his support, encouragement and advice during this work. I would like to thank my coauthors Dr. Massimo Tallarida …

15:45 Kohvipaus 16:15 Massimo Tallarida Photoemission investigations with Synchrotron light: In-situ Atomic Layer Deposition (ALD) of oxides monitored cycle by cycle. 17:15 Andrus Salupere Üldine mittelineaarsus I (esitluse pdf) 18:00 Paus 18:15 Andrus Salupere Üldine mittelineaarsus II ja Mittelineaarsete Protsesside ...

3 Characterization Chair: Uwe Schröder Massimo Tallarida, (ALBA Synchrotron, Barcelona, Spain) ...

Chittaranjan Das Massimo Tallarida Dieter Schmeißer Photoelectrochemical (PEC) water splitting is one of the most emerging fields for green energy generation and ...

Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films

Daniel Cuypers, KULeuven; Dennis H. van Dorp, imec, Belgium; Massimo Tallarida, Brandenburg University of Technology Cottbus; Simone Brizzi, ...

Height distribution of atomic force microscopy images as a tool for atomic layer deposition characterization Massimo Tallarida, ...

... Hossein Salami, Hele Savin, Nathanaelle Schneider, Thomas E. Seidel, Pia Sundberg, Jonas Sundqvist, Dmitry Suyatin, Massimo Tallarida, Tobias Törndahl, ...

TiO2 laminated Silicon microstructures based stable photocathode for water splitting — • Chittaranjan Das, Massimo Tallarida, and Dieter Schmeisser: 16:00: HL 86.5:

Autoren: Krzysztof Kolanek, Massimo Tallarida, and Dieter Schmeisser. Journal: Journal of Vacuum Science & Technology B. Band: 31. Ausgabe: 1. Jahrgang ...

Massimo Tallarida , Brandenburg University of Technology Cottbus. Simone Brizzi , Brandenburg University of Technology Cottbus. Leonard Rodriguez , Imec.

Despite increasing attention for the recently found ferro- and antiferroelectric properties, the polymorphism in hafnia- and zirconia-based thin films is still...

Al-oxynitrides as a buffer layer for Pr2O3/SiC interfaces

By Massimo Tallarida in Condensed Matter Physics and Quantum Physics.

Aile Tamm, Marianna Kemell, Jekaterina Kozlova, Timo Sajavaara, Massimo Tallarida, Kaupo Kukli, Väinö Sammelselg, Mikko Ritala, Markku Leskelä.

Atomic layer deposition of nanolaminate oxide films on Si