53 Infos zu Thomas Feudel

1 Aktuelle Nachrichten

2 Profile in Sozialen Netzwerken

Thomas Feudels berufliches Profil anzeigen LinkedIn ist das weltweit größte professionelle Netzwerk, das Fach- und Führungskräften wie Thomas Feudel dabei …

Sehen Sie sich das Karriere-Profil von Thomas Feudel (Deutschland) auf LinkedIn an. LinkedIn ist das weltweit größte professionelle Netzwerk, das Fach- und ... Es fehlt: smb ‎immobilien

2 Hobbys & Interessen

Stephan Waidmann · Stephan Waidmann · Steven R. Soss · Sven Beyer · Thilo Scheiper · Thomas Feudel · Thomas Werner · Thorsten Kammler · Tibor Bolom.

Thomas Feudel patents Recent bibliographic sampling of Thomas Feudel patents listed/published in the public domain by the USPTO (USPTO Patent Application #,Title):

2 Infos zur Ausbildung

... Fabian M. BUFLER · Thomas FEUDEL · Wolfgang FICHTNER Publication IEICE TRANSACTIONS on Electronics Vol.E86-C No.3 pp

Andreas SCHENK Bernhard SCHMITHUSEN Andreas WETTSTEIN Axel ERLEBACH Simon BRUGGER Fabian M. BUFLER Thomas FEUDEL Wolfgang FICHTNER Summary | Full Text:PDF (1.4MB)

8 Bücher zum Namen

Thomas Feudel, Dresden, Germany. Takamitsu Bingliang Gao, Kyoto, Japan. Sukanta ... Jesse Jur, Raleigh, NC. Bhargava ECS's rapid-.

Device simulation has two main purposes: to understand and depict the physical processes in the interior of a device, and to make reliable predictions of the...

Ion Implantation and Activation presents the derivation process of related models in a comprehensive step by step manner starting from the fundamental...

Over the past two decades, technologies for microsystems fabrication have made considerable progress. This has made possible a large variety of new commercial...

4 Dokumente

· ... Corrado Bongiorno, Brunella Cafra, Giovanni Mannino, Emanuele Rimini, Till Metzger, Cristian Mocuta, Thorsten Kammler, Thomas Feudel.

A method of generating an ion implantation distribution by a computer is disclosed. The method includes calculating ion implantation distribution regions in a...

1 AVS Newsletter Spring AVS 125 Maiden Lane, 15th Floor New York NY PRESIDENT S REPORT Looking Forward to By D...

M.BUFLER, Thomas FEUDEL, and wolfgang FICHTNER, “Simulation of RF noise in MOSFETs using different transport models”, IEICE Trans. Electron, E86-.

9 Wissenschaftliche Publikationen

Inventors: Thomas Feudel (Radebeul), Manfred Horstmann (Dresden), Karsten Wieczorek (Boxdorf) Application Number:

Marc Herden, Daniel Gehre, Thomas Feudel, Andy Wei, ... Jaap v.d. Berg. Pages : Download PDF. Article preview. select article Manufacturability of fully ...

Bibliographic content of Custom Integrated Circuits Conference 2009

List of computer science publications by Thomas Feudel

1 Allgemeine Veröffentlichungen

... of HALO and drain-extension doping gradients on transistor performance. By Axel Erlebach A, Thomas Feudel B, Andreas Schenk C and Christoph Zechner A  ...

1 Meinungen & Artikel

· Karuppanan Sekar, Wade A. Krull, Thomas N. Horsky, Thomas Feudel, Christian Krüger, Stefan Flachowsky, Ina Ostermay, Optimization of ...

21 Webfunde aus dem Netz

A semiconductor device is fabricated by implanting into a semiconductor substrate non-doping ions at a tilt angle of at least about 10° to laterally...

US A1 * Thomas Feudel Semiconductor device having improved doping profiles and method of improving the doping ...

A process for forming a structure of a high-frequency bipolar transistor on a layer of a semiconductor material with conductivity of a first type. The...

... and the ISE who helped me during this time and also later I am especially grateful to Ulrich Krumbein, Andreas Schenk, Thomas Feudel, Christoph Wicki, ...

... Krueger 1, Thomas Feudel 1, Youn-ki Kim 2, John Flanagan 2, Thirumal Thanigaivelan 2, Zhiyong Zhao 2 1 Globalfoundries Dresden 2 Varian Semiconductor ...

Atomistic Modeling of the Ion Implantation Step Within a 2D Process Simulator - Volume Bruno Schmidt, Matthias Posselt, Norbert Strecker, Thomas Feudel

A semiconductor device having a strained channel and a method of manufacture thereof is provided. The semiconductor device has a gate electrode formed...

A method for fabricating a semiconductor device, comprising the steps of: providing a semiconductor substrate including a core device region and an...

US *, 19 May 2003, 6 May 2004, Thomas Feudel, Semiconductor device having improved doping profiles and method of improving the doping ...

Effect of Underlap on Input Impedance, Gain and Noise Figure in FinFET Based LNA

... für angewandte Forschung und Technologie e.v. (ZAFT) Dr.-Ing. Jan Höntschel Dr.-Ing. Thomas Feudel Dr.-Ing. Manfred Horstmann AMD Saxony LLC & Co.

1-7, [4] Gerhard Wachutka, Herbert Pavlicek, Thomas Fabula, Henning Haffner, Nicolaus Hey, Thomas Feudel, and Robert Strecker, CAD tools for MEMS.

of Washington, U.S.A.. Thomas Feudel, AMD Saxony LLC & Co. KG, Germany.

Applicant. ADVANCED MICRO DEVICES INC. Inventor. Thomas Feudel Patrick Press Sven Beyer. Opposition. -. Filed Published.

Alessandra Alberti, Corrado Bongiorno, Brunella Cafra, Giovanni Mannino, Emanuele Rimini, Till Metzger, Cristian Mocuda, Thorsten Kammler, Thomas Feudel

U.S.A.. Thomas Feudel, AMD Saxony LLC & Co. KG, Germany. Masami Hane, NEC Corporation, Japan. Anco Heringa, Philips Research Laboratories ...

Influence of HALO and drain-extension doping gradients on transistor performance Axel Erlebach a,, Thomas Feudel b, Andreas Schenk c, Christoph.

Patent applications by Thomas Feudel, Radebeul DE

more. COLLAPSE. Kunihiro Suzuki, Ritsuo Sudo, Thomas Feudel · Details · Authors · Fields of science · Bibliography · Quotations · Similar · Collections ...

Patent application number Description Published; : TECHNIQUE FOR ENHANCING TRANSISTOR PERFORMANCE BY TRANSISTOR SPECIFIC CONTACT DESIGN - By locally